Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators

Published in Journal of Low Temperature Physics, 2020

Recommended citation: Sheagren, C., Barry, P., Shirokoff, E. et al. Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators. J Low Temp Phys 199, 875–882 (2020). https://doi.org/10.1007/s10909-020-02336-2 https://link.springer.com/article/10.1007/s10909-020-02336-2

This paper is about initial developments for ALD NbN films for MKIDs applications.

Download paper here